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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 10 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

BOE Solution

BOE is a solution made by mixing 40% NH4F solution with 49% HF solution.

Typically used for removal of large amounts of oxide

Can be used with photoresist

Higher capacity for Si, since it can tie up the etch product as SiF62-

Si02  +   6HF     

2 H2O  +  H2SiF6

SiO2 +  4 HF  + 2 NH4F

2 H2O  +  (NH4)2SiF6

In HF Solution:

In BOE:

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