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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 11 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Nitride Etch

Concentrated (85%) Phosphoric acid

High temperature (> 145 °C)

Etches oxide at a slow rate (selectivity > 30)

Can also etch polysilicon

Difficult to operate

Influenced by the water content   

Water is injected or dripped in

Bath is covered and fitted with a condenser

Difficult to rinse

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