NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing
Oxide surfaces can be formed:
by room temperature oxidation of “bare” silicon surfaces (native oxide)
by heating silicon in an oxygen atmosphere (thermal oxide)
by deposition in a low pressure furnace (LPCVD oxide)
by deposition from decomposition of TEOS in a plasma reactor (plasma TEOS or plasma oxide)
All oxide surfaces are hydrophilic, but they etch at different rates in HF.