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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 18 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Oxide Surfaces

Oxide surfaces can be formed:

by room temperature oxidation of “bare” silicon surfaces (native oxide)

by heating silicon in an oxygen atmosphere (thermal oxide)

by deposition in a low pressure furnace      (LPCVD oxide)

by deposition from decomposition of TEOS in a plasma reactor (plasma TEOS or plasma oxide)

All oxide surfaces are hydrophilic, but they etch at different rates in HF.

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