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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 23 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

NH4OH-H2O2 (SC1/APM)

Typically used with a Megasonic unit for particle removal

Temperature range of 50-80°C

Standard solution is 5:1:1 of water:ammonia:peroxide

Problems

Peroxide is unstable in basic solution, especially in the presence of metallic impurities.

Ammonia has high volatility.

Metallic impurities readily adsorb onto surfaces.

Presence of the oxidant is critical!

»

If lost, solution will etch silicon

»

Maintained by spiking

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