NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing
Typically used with a Megasonic unit for particle removal
Temperature range of 50-80°C
Standard solution is 5:1:1 of water:ammonia:peroxide
Peroxide is unstable in basic solution, especially in the presence of metallic impurities.
Ammonia has high volatility.
Metallic impurities readily adsorb onto surfaces.
Presence of the oxidant is critical!
If lost, solution will etch silicon
Maintained by spiking