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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 24 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

NH4OH-H2O2 Details

Can grow a native (chemical) oxide on a bare silicon

Also etches oxides at a low rate (~1Å/min), therefore can etch silicon

Dilutions down to 50:1:1 probably as effective

May have problems the current solutions do not  

Al and Fe contamination - typical problem  

Other transition metals can also deposit

Can also result in surface roughening

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