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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 26 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

HCl-H2O2 (SC2/HPM)

Temperature range of 50-70°C

Standard dilution is 5:1:1 of water:HCl:peroxide

Mechanism for operation - chlorides of most metallic contaminants are soluble in an acidic solution

Peroxide may not be needed at low metallic contamination levels.

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