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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 27 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Solvent Based Cleaning Solutions

Resist strippers - proprietary mixtures of organic solvents and active ingredients

The solvents are typically NMP (N-methyl pyrrolidone)

NMP is water soluble and neutral in aqueous solution

“Active ingredients” are typically amines

Attack the resist and dissolve into the solvent media.

New strippers - “semi-aqueous”, containing both organic solvents and water along with “active ingredients” and corrosion inhibitors

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