NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing
Solvent Based Cleaning Solutions
Resist strippers - proprietary mixtures of organic solvents and active ingredients
The solvents are typically NMP (N-methyl pyrrolidone)
NMP is water soluble and neutral in aqueous solution
“Active ingredients” are typically amines
Attack the resist and dissolve into the solvent media.
New strippers - “semi-aqueous”, containing both organic solvents and water along with “active ingredients” and corrosion inhibitors