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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 29 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Solvent Modified Cleans e.g. EG-BOE

Residues after metal etch processes often contain compounds of the metal etched, along with other species.

Cleaners contain fluoride and a polar solvent such as ethylene glycol to dissolve these metallic compounds.

Involves a balance of acidity and etching of the fluoride with the inhibition of metal attack by ethylene glycol

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