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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 30 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Water

Most heavily used chemical - 2000 gal/wafer

Used mainly for removing other chemicals

Rinse times

until solution reaches high resistivity

given time period

Problems

Bacteria

TOC

Metallic contamination

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