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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 31 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Wafer Rinsing

Continuous flow of water past wafers  

Completion of rinse is determined by measuring the resistivity of the water

(Resistivity = very sensitive method of determining the presence of ions in solution)

Dump rinsing - used for wafers that are hydrophilic

Hot water - used after some processes (but not HF treated surfaces)

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