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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 42 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Post Implant Resist Strip

Implantation sometimes uses resist masks

High dose implants can convert photoresist to a coal-type material

Can be ashed if it is done carefully, but problems can result

Residue can be more complex since it can contain residue from the implant

May require more than a sulfuric-peroxide clean

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