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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 45 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

Pre-Diffusion Clean

Cleans before furnace operations are critical

Defects or contamination will be incorporated into the wafer if not removed prior to furnace

Most important steps - those where bare silicon is present

Pre-initial

Pre-sac gate

Pre-gate

Typically full cleans (Piranha+BOE+SC1+SC2)

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