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Thomas S. Roche, Ph.D. Motorola Corporation  1999 Arizona Board of Regents for The University of ... - page 9 / 47

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Roche

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NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

HF Etches

HF based solutions (Dilute HF or BOE) etch silicon dioxide with a rate dependent on the concentration of HF in the solution.

The actual etchant in more concentrated fluoride solutions is HF2, which is a result of the equilibria:

Very selective

No attack on silicon or silicon nitride  

However, photoresist or thin polysilicon are not always adequate masks.  

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